The largest of the SE/SEC-Series, the SE-1000, is typically equipped with a 25.5″ diameter, water-cooled bell jar, a 26″ diameter stainless steel baseplate, and Planetary Fixturing holding up to thirty six 4″ wafers. One Button Automation and Lift-Off Fixturing are among the most popular options added to the system.

Ultimate vacuum: 10-8 torr range

• Ultimate vacuum: 10-8 torr range
• Cryogenic pump: 10″
• Mechanical pump: 23-57 CFM, dual stage
• Cold trap: 3.7 liter capacity, 250 sq. inches of surface area, 10 hours holding time
• Water baffle: Optically dense, chevron baffle
• High vacuum valve: 11-3/4″ I.D., seals vertically
• Foreline/Roughing valves: 3″ I.D.
• Valve actuation: Electro-pneumatic (all vacuum valves)
• Valve sequencing: Manual and automatic (Auto-Tech II)
• Ionization gauge control: Dual ionization gauge tube, auto ranging with dual convectron positions
• Dimensions: 79″H x 43″W x 37″D
• Weight: 1,500 pounds
• Utilities:
  • Electrical: 208/30/70A/5-wire connection with ground
  • Water: 10 GPM (minimum)
  • Air: 90-110 PSIG
    
    
• Options:
  • Diffusion pump: 5300 liter/second, 10″ normal
  • Process chamber: 25.5″ diameter x 30″ H, ambient or water-cooled (32″ bell jar available)
  • Fixturing: Variety of fixturing options: planetary, clamshell, or custom
  • Baseplate: 26″ diameter, 11-3/4″ pumping port (32″ baseplate available)
  • Substrate heat: 2-10 kW
  • Sources: Any commercially available source, including single and multiple beam, CHA’s resistance and sputtering sources
  • Hoists: Motorized hoist assembly, 1/2HP motor
  • LN2 Level Control: Automatically maintains liquid level in cryogenic trap
  • Sieve trap: Molecular sieve trap prevents migration or backstreaming of mechanical pump oil into the system
  • RGA port: 2.75 O.D. flange located in base plate of system provides integration of a residual gas analyzer
  • Automatic deposition control: Process controller provides fully automatic deposition sequence
  • Automatic gun rotation control: Positions the crucibles of a turret-type electron beam source
  • Shutter/shutter control: Different design shutters can be incorporated depending on source configuration and number.